We have added a polarizer to our desktop R and T measurement system. The same polarizer can be used for all systems recording R and T for shiny, non-scattering samples.

The desktop system records the 100% signal when detector and light source are positioned directly opposite to each other:

After this measurement you can do absolute reflectance measurements at arbitrary angles of incidence. We have generated tools to conveniently set fixed angles of incidence – here we have used 45° and 60°.

The graph below shows 4 absolute spectra of a silicon wafer (45°, 60°, s- and p-polarization). We could achieve almost perfect match of simulated spectra based on literature data of the optical constants, fitting a thickness of 6.2 nm of the native SiO2 layer on the wafer. Data acquisition for each spectrum took less than 1 second (averaging 18 spectra using an integration time of 50 ms).